Agenda 分析背景與目的 專利文件選擇 關鍵字分類 專利文件分群 專利品質分析 結論

分析背景 Dimension increase in MOS (Advanced Process) High speed Low dissipation Low costs High profits In Digital application, the transistor play the role of switch in the system just like a mechanical switch, it means that the key component to storage the 0 and 1. Dimension increase in MOS (Advanced Process)  Device Performance Problems Logic Circuit Memory Circuit Hideo Sunami (2010)

分析目的 Process Migration Low? High? Model is verified by hardware data 是否可由Process Migration區分Patent Quality 的好壞？ 是否可從Patent Quality解釋期中報告的結論？

專利文件選擇

專利文件選擇 Patents: 835  23 H01L21/84 基板為半導體以外者，例如絕緣體者 H01L21/02 半導體裝置或其部件之製造或處理 H01L21/336 具有絕緣閘者 H01L21/8238 互補型場效應電晶體 H01L29/76 單極裝置

關鍵字處理 (NTFIDF) KP: 561  156  combining and deleting     80 (ave NTFIDF: 74.28)

關鍵字處理 (Deleting KP) Deleted 32 KPs

關鍵字處理 (Combining KP) Combined 295 KPs

關鍵字分類 (IC Design to Mask Fabrication) FEOL/BEOL Layout Mask Process flow (oxidation + PECVD + APCVD + sputtering + etching + implantation + diffusion + lithography + etc.) Process (oxidation/PECVD/APCVD/sputtering/etching/implantation/diffusion/lithography/etc.)

關鍵字分類 (IC Design and Devices) Device Component (substrate /source /drain /gate/well /etc.) Mask IC Device (substrate + source + drain + gate + well + etc.) FEOL/BEOL Layout

關鍵字分類 80 KPs  9 items

專利文件分群 using k-means clustering

專利品質分析 using PCA Medium Low Quality Quality High Quality Medium

專利品質分析 High Low High Medium

專利品質分析

結論 是否可由Process Migration區分Patent Quality 的好壞？

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