NDL使用氣體、TLV、設定警報值、氣味 The MAK(maximum workplace concentrations, same as TLV, threshold limit value) value is defined as the maximum concentration of a chemical substance (a gas, vapour or particulate matter) in the workplace air which generally does not have known adverse effects on the health of employees nor causes unreasonable annoyance (e.g. by nauseous odour), even when a person is repeatedly exposed during long periods, usually for 8 hours daily but assuming on average a 40-hour working week. Threshold limit value − short-term exposure limit (TLV-STEL): spot exposure for a duration of 15 minutes, that cannot be repeated more than 4 times per day with at least 60 minutes between exposure periods Threshold limit value − ceiling limit (TLV-C): absolute exposure limit that should not be exceeded at any time Flammability = Explosive ? NDL使用氣體、TLV、設定警報值、氣味 項次 氣體名稱 TLV 設定警報值(warning) 設定警報值(alarm) 氣味 TLV-STEL TLV-C Flammability Limit - Upper (%) Flammability Limit - Lower (%) Explosive Limit - Upper (%) Explosive Limit - Lower (%) SDS of company 1 Ar/氬氣 無 19%(測含氧) 18%(測含氧) 無味 2 AsH3/砷化氫 0.05 ppm 0.03 ppm 窒息的蒜味 0.25 ppm ? 77.8 3.9 Not applicable THE LINDE GROUP (100%) 3 BCL3/三氯化硼 2.5 ppm 5 ppm 刺激味 4 BF3/三氟化硼 0.5 ppm 1 ppm最高容許 5 B2H6/二硼烷 0.1 ppm 厭惡難聞的氣味 6 CF4/四氟甲烷 4000 ppm 5000 ppm 7 C4F6/六氟丁二烯 8 C4F8/八氟環丁烷 乙醚樣 9 CHF3/三氟甲烷 10 CH2F2/二氟甲烷 25 ppm 50 ppm 11 CH3F/氟甲烷 甜味 12 CH3OH、MeOH/甲醇 200 ppm 600 ppm 輕微酒精味 13 CH4/甲烷 12.5%(LEL) 25%(LEL) 無味或微甜酒味 14 CL2/氯氣 0.2 ppm 0.4 ppm 辛辣味 15 CO/一氧化碳 35ppm 12.5 ppm 35 ppm 16 CO2/二氧化碳 17 GeH4/四氫化鍺 N/A Metaloid Precursors, Inc. (100%) 18 Ge2H6/乙鍺烷 100 ~0.5 AIR LIQUIDE (100%)

NDL使用氣體、TLV、設定警報值、氣味 項次 氣體名稱 TLV 設定警報值(warning) 設定警報值(alarm) 氣味 TLV-STEL TLV-C Flammability Limit - Upper (%) Flammability Limit - Lower (%) Explosive Limit - Upper (%) Explosive Limit - Lower (%) SDS of company 19 H2/氫氣 無 500 ppm 1000 ppm 無味 20 HBr/溴化氫 3 ppm 1.5 ppm 辛辣味 21 HCL/氯化氫 2.5 ppm 5ppm最高容許 刺激味 22 He/氦氣 19%(測含氧) 18%(測含氧) 23 N2/氮氣 24 NF3/三氟化氮 10 ppm 5 ppm 發霉味 25 NH3/氨 50 ppm 12.5 ppm 25 ppm 強刺激味 26 N2O/一氧化二氮 甜味 27 O2/氧氣 81%(測含氧) 82%(測含氧) 28 PH3/磷化氫 0.3 ppm 0.15 ppm 0.3ppm 魚腥味 ? 98 1.2 Not applicable Praxair, Inc. (100%) 29 SF6/六氟化硫 30 SiCl4/四氯化矽 31 SiF4/四氟化矽 0.5 ppm 1 ppm (比照BF3) 32 SiH2CL2/二氯矽烷 刺激酸味 33 Si2H6/二矽烷 34 Si3H8/三矽烷 35 SiH4/矽甲烷 96 1.4 36 TEOS/四乙氧基矽烷 30 ppm (OSHA最高容許100ppm) 酒精味 37 WF6/六氟化鎢 3 ppm

四族磊晶設備使用特殊氣體TWA、爆炸界限 氣體名稱 氣體 純度 雜質 (ppm) 八小時日時量 平均容許濃度 爆炸界限 備註 GeH4 10% in H2 10-5 (元佳宇) N2:2, O2+Ar:0.5, CO2:2, H2:50, H2O:1, CO:1, CH4:1, Ge2H6:20, Germoxanes:5, Germanium Chlorides:5, Ge3H8:1 0.2 ppm 0.8%-98% 專用 SiH4 100% 20170421改10% 10-6 5 ppm 1.4%-96% SiCH6 10-4 N2:10, Ar+O2:2, CO2:10, CH4:10, SiH4:50, Chlorosilanes:50, H2O:0.02 我們以約同SiH4、DSC 5ppm處理 1.3%-44% Si3H8 (Liquid) (Bubbling) (Carrier gas:H2) (ASM) SiH4:500, CH4:2, Ar+O2+N2:3, CO2:2, Siloxanes: 5 我們以約同SiH4、DSC 5 ppm處理 自燃 Ge2H6 Ge2H6 10-5(Voltaix) H2 10-6 2vppm CO2, 300vppm Ge2H6, 5000vppm GeH4, 2vppm H2O, 2vppm N2, SnCl4(liquid)(bubbling)(carrier gas: H2) (9.751torr@10oC, 20.252torr@22oC) 10-5(SAFC , Conary Enterprise Co., Ltd) 0.3ppm Al, 0.9ppm As, 0.5ppm Ca, 0.2ppm Mo (from 20141212 COA) DCS (Liquid) (~40℃) (167 kPa(1252.6torr) at 20 °C) (Shin-Etsu) N2:1, O2+Ar:1, CO2:0.5, CO:0.5, Monochlorosilain:100, Trichlorosilain:100, Tetrachlorosilain:100 5 ppm (最高容許濃度) 4.1%-99% 共用 PH3 1% in H2 (大陽日酸) N2:1, O2:0.1, CO:0.1, CO2:0.1, CH4:0.1, H2O:1 0.3 ppm 1.6%-98% B2H6 N2:10, O2:1, CO:0.02, CO2:5, CH4:5, H2O:0.5 0.1 ppm 0.8%-88% HCl 10-7 ＊ H2O<150 ppb (Complete metal removal) - H2 10-10 ＊ H2O<100 ppt, O2<100 ppt, CO2<100 ppt, Non-Methane Hydrocarbons<100 ppt, CO<1 ppb 4%-75% N2 He H2:0.01, Ar:0.01, N2:0.01, O2:0.01, CO:0.01, CO2:0.02, H2O:0.1, Hydrocarbons:0.01 ＊ Purification system

SnCl4 cabinet (bubbler) (Veeco Piezocon台灣獨家代理) Purchasing: Precursor Supply System Item Item Description Company Contact Person 1. Ge2H6 cylinder Voltaix (亞東工業氣體股份有限公司 Air Liquide) 利雅君 小姐 0912790719 03-6203888 2. SnCl4 cylinder 賽孚思SAFC (智林企業股份有限公司代理) 孫任雯 小姐 02-25091399 分機 137 3. SnCl4 cabinet (bubbler) Ceres (吉利康股份有限公司代理) 楊義龍 先生 0911673876 4. Ge2H6 delivery to ASM 吉利康股份有限公司 (Veeco Piezocon台灣獨家代理) 5. SnCl4 delivery to ASM

Bond dissociation energy: H3Si-H: 3.92 eV [1] Si-Si: 2.31 eV [2] Bond energy: Si-H 3.31 eV Si-Cl 3.97 eV Si-Si 2.31 eV Ge-H 3.01 eV Ge-Ge Sn-H Sn-Sn H3Si-Cl [5] 4.43 eV H3Ge-Cl [5] 3.85 eV H3Sn-Cl [5] 3.67 eV GeH4 Ge2H6 Ge3H8 Si3H8 Physical form gas liquid Boiling point @NTP -88.4 °C 31.5°C 110.5°C 52.9°C Vapor pressure ~33700 torr at 20°C ~517 torr ~30 torr ~245 torr Melting point -165.9°C -109°C -105.6°C -117.4ºC Flammability Flammable gas Solubility in water insoluble Unknown (decomposes) Exposure limit 0.2 ppm 5 ppm Bond dissociation energy: H3Si-H: 3.92 eV [1] Si-Si: 2.31 eV [2] Ge-H: 3.39-4.00 eV [3] Ge-Ge: 1.96 eV [4] Ref: [1] Acc. Chem. Res., 1981, 14 (8), pp 246–252. DOI: 10.1021/ar00068a004 [2] D. Crippa et al. (Eds.), Silicon Epitaxy, Academic Press, San Diego CA (2001) [3] International Journal of Chemical Kinetics, Volume 15, Issue 6, June 1983, pp. 547–560. DOI: 10.1002/kin.550150605 [4] The Journal of Chemical Thermodynamics, Volume 6, Issue 2, February 1974, Pages 191-199. https://doi.org/10.1016/0021-9614(74)90262-6 [5] J. Am. Chem. Soc., Vol. 121, No. 4, 1999, pp. 822-834. NTP = 21°C and 1 atm Chem. Mater. 2012, 24, 1619−1628. Ref: D. Crippa et al. (Eds.), Silicon Epitaxy, Academic Press, San Diego CA (2001) Ref: K. H. Chung et al., Appl. Phys. Lett., 32, 113506 (2008).

(GR(N2)-GR(H2))/GR(H2) (N2 vs. H2) 600C GR enhancement factor Ref: Chung, K. H., et al., Applied Physics Letters 92.11 (2008).

楊處長課

SIMS beam size TEM beam size (EDS): 2 nm x 2 nm

Gas delivery to ASM (同一) SnCl4 POWER SnCl4 氣瓶櫃 1ψ220v4.5a 1 消防管 FNPT 25A 氣體偵測 SnCl4氣瓶櫃 SnCl4機台端(Tool) SnCl4SCRUBBER PH2氣瓶櫃 PH2 GAS BOX(1F) PH2機台端(Tool) Exhaust SnCl4 氣瓶櫃(SEX 製程酸排) 6"SUS304+Coating GAS 廠務端 to GAS BOX~氣瓶櫃(SnCl4 Carrier gas) PH2 1/4"SUS316L EP 廠務端 to 氣瓶櫃(SnCl4 Purge gas) PN2 1/4"SUS316L EP 廠務端 to 氣瓶櫃(SnCl4 Vac Drive gas) GN2 1/4"SUS316L BA 廠務端 to 氣瓶櫃(SnCl4 CDA gas) CDA 1/4"SUS316L BA 氣瓶櫃(SnCl4 Process outlet gas) to ASM Tool SnCl4 3/8"SUS316L EP雙套管 氣瓶櫃(SnCl4 Vent gas) to VACUUM LINE Vent 1/2"SUS316L BA PH2 GAS BOX (1F) SUS

Gas delivery to ASM (同一) Ge2H6 POWER Ge2H6 氣瓶櫃 1ψ110v 0.5kva 1 Ge2H6 氣瓶櫃-內部加熱器 3ψ220v 10kva Ge2H6 氣瓶櫃-外部管路 to Tool加熱器 消防管 FNPT 25A 氣體偵測 氣瓶櫃 機台端(Tool) SCRUBBER Ge2H6 GAS BOX(GB) Vacuum line 4"pipeing增加Vent 1/2"vcr接點*2點(Ge2H6/SnCl4) 4"S304L+Coating Exhaust Ge2H6 氣瓶櫃(SEX 製程酸排) 6"SUS304+Coating Ge2H6 GAS BOX(SEX 製程酸排) 4"SUS304+Coating GAS 氣瓶櫃PN2內部迴路(Ge2H6 Purge gas) PN2 1/4" SUS316L EP 廠務端~氣瓶櫃(Ge2H6- VG N2 IN and AIR ) GN2 1/4"SUS316L EP 2 氣瓶櫃(Ge2H6 Process outlet gas) to GAS BOX(GB) to ASM Tool Ge2H6 3/8"SUS316L EP雙套管 氣瓶櫃(Ge2H6 Vent gas) to VACUUM LINE Vent 1/2"SUS316L BA Ge2H6 FAB(2F) -- GB 烤漆 GeH4 VMB to Ge2H6 VMB & 舊GeH4修改